Date of Graduation
Master of Science in Materials Science
Physics, Astronomy, and Materials Science
The fundamental step for development of novel materials like semiconductors involves stacking of layers of thin films of materials with desired properties on a particular substrate. In order to study the properties of these materials for research purposes in the laboratory, development of a clean fabrication technique is essential. PLD is a technique employed for growing thin films using laser ablation of a target material. CVD is an alternate method used to deposit solid materials from a gaseous phase. However, combining these two techniques can enhance plume, gas and laser interaction to facilitate the growth of novel materials with new and improved properties. Conformity and purity play pivotal roles in the thin film growth process. While working under Ultra-high vacuum can eliminate impurities, on the other hand, proper screening and thermal activation of the plasma of ablated materials ensures a smooth registration of the film with the substrate. We aim at studying the effect of substrate, temperature and carrier gas on the resulting films and to allow variance between the two techniques. For analysis and characterization of the developed film, we employ standard techniques like SEM, XRD, AFM, Raman spectroscopy and Profilometry. For initial proof of performance, we demonstrate growing a metal nitride.
ultra-high vacuum, PLD, CVD, optical chopper, conformity, purity, novel materials, thin film, aluminum nitride, 2D materials
Materials Science and Engineering
© Sinjan Majumder
Majumder, Sinjan, "Development of a CVD Assisted PLD System for Growing Novel Materials" (2020). MSU Graduate Theses. 3526.