"Instability of Kinetic Roughening in Sputter-Deposition Growth of Pt o" by J. H. Jeffries, J.-K. Zuo et al.
 

Abstract

Using scanning tunneling microscopy, we have studied the kinetic roughening in the growth of Pt sputter deposited on glass at room temperature for a film thickness range of 15–140 nm. The growth exhibits an irregularly growing mound morphology and shows an instability with anomalous scaling behavior characterized by the √ ln ( t ) dependence of the local slope, where t is the growth time, and also by the roughness exponent α ≃ 0.9 and interface growth exponent β ≃ 0.26 . These characteristics clearly indicate that the growth is consistent with a statistical model of linear diffusion dynamics.

Department(s)

Physics, Astronomy, and Material Science
Biomedical Sciences

Document Type

Article

DOI

https://doi.org/10.1103/physrevlett.76.4931

Rights Information

© 1996 The American Physical Society

Publication Date

1996

Journal Title

Physical review letters

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