Graphitic structure formation in ion implanted polyetheretherketone

Abstract

Ion implantation is a technique that is used to change the electrical, optical, hardness and biocompatibility of a wide range of inorganic materials. This technique also imparts similar changes to organic or polymer based materials. With polymers, ion implantation can produce a carbon enriched volume. Knowledge as to the nature of this enrichment and its relative concentration is necessary to produce accurate models of the physical properties of the modified material. One technique that can achieve this is X-ray photoelectron spectroscopy. In this study the formation of graphite like structures in the near surface of polyetheretherketone by ion implantation has been elucidated from detailed analysis of the C 1s and valence band peak structures generated by X-ray photoelectron spectroscopy. Further evidence is given by both Rutherford backscatter spectroscopy and elastic recoil detection. © 2013 Elsevier B.V. All rights reserved.

Department(s)

Center for Applied Science and Engineering

Document Type

Article

DOI

https://doi.org/10.1016/j.apsusc.2013.06.060

Keywords

ERD, Ion beam induced graphitization, Ion implantation, Polyetheretherketone, RBS, XPS

Publication Date

10-15-2013

Journal Title

Applied Surface Science

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