Photoreflectance and Its Application to Semiconductor Characterization
Date of Graduation
Fall 1998
Degree
Master of Science in Materials Science
Department
Physics, Astronomy, and Materials Science
Committee Chair
Shyang Hwang
Abstract
A photoreflectance measurement system has been designed and implemented. The system provides a sensitive, accurate, and nondestructive means for the study and characterization of semiconductors. The system includes a microcontroller-based servomechanism to drive a variable neutral density filter for signal normalization. System performance under different conditions has been investigated. The methods to suppress the noise in the measurement are examined. The prototype system has been successfully applied to the characterization of CdTe, semi-insulating GaAs, and GaAs thin films grown on semi-insulating GaAs and Si-doped GaAs in the molecular beam eptaxial system.
Subject Categories
Materials Science and Engineering
Copyright
© Jianrong Lin
Recommended Citation
Lin, Jianrong, "Photoreflectance and Its Application to Semiconductor Characterization" (1998). MSU Graduate Theses. 838.
https://bearworks.missouristate.edu/theses/838
Dissertation/Thesis
