The Growth and Characterization of GaN Thin Films on SiC Substrates
Date of Graduation
Spring 2000
Degree
Master of Science in Materials Science
Department
Physics, Astronomy, and Materials Science
Committee Chair
Shyang Hwang
Abstract
Optical devices based on III-V nitrides operating in the visible region involve GaN based materials. The development of such devices first requires the optimization of GaN crystal quality. This thesis addresses issues related to substrate cleaning and growth of high quality GaN on C-terminated 6H-SiC substrates by molecular beam epitaxy. Good substrate cleaning methods by H₂: He (1:1) plasma at 940°C for 100 minutes have been used to obtain GaN thin films with excellent structural and optoelectronic properties. The full-width at half-maximum values of the x-ray diffraction and photoluminescence peaks are about 90 arc-second and 1.4 meV at 4.2K for C-termnated 6H-SiC substrates, respectively.
Subject Categories
Materials Science and Engineering
Copyright
© Ailing Cai
Recommended Citation
Cai, Ailing, "The Growth and Characterization of GaN Thin Films on SiC Substrates" (2000). MSU Graduate Theses/Dissertations. 839.
https://bearworks.missouristate.edu/theses/839
Dissertation/Thesis
